Quartz Flow Guide Cylinder

1. High Munditia & Chemical Repugnantia
2. Eximia scelerisque stabilitas
3. Subtilitas Machining
4. Optical Perspicuus
5.Low friction Surface

Description

Applications

Semiconductor Vestibulum

Adhibetur in depositione vaporum chemicorum (CVD), plasma etching, et processuum diffusionis ad fluxum gasi ducendum et lagana tuendum.

Solaris Energy Productio

Essentiale in cellularum photovoltaicarum productione, uniformis gasi distributio in altis- fornacibus temperaturae cavet.

Chemical & Petrochemical Industry

Directiones reactant in reactoria, columnas distillationes et converters catalyticos influunt.

Laboratorium Research

Sustinet experimenta moderata ducendo fluidum vel gas influentem in altum- temperaturam vel ambitus mordax.

Aerospace & High-Tech Vestibulum

Applicari in probatione cubicula ad alta- temperaturae gasi dynamici et materialis processui.

Corporalia Properties	Values
Puritas	＞99.99%
Density	2.2g/cm³
Perspicuus	＞90%
Mohs duritia	5.5--6.5
Deformatio Point	1280 gradum
mollire Point	1780 gradum
Anneaning Point	MCCL gradus
Calor specifica (20 - 350 gradus)	670J/kg. gradus
Scelerisque Conductivity (20℃)	1.4W/m. gradus
Calor Conductivity (w/mk, 1000 gradu)	1.0-1.2
Index refractivus	1.4585
Coefficiens Scelerisque Expansion	5.5*10 ^-7cm/cm. gradus
Calidum - caloris operans	1750--2050 gradum
Brevis - terminus Service Temperature	MCCC gradum
Longa - vox servitii Temperature	MC gradum

Chemical Properties	Values
Acidum repugnans	Acidum validum (excepto HF), alcali firmo, solutione organica
Princeps temperaturis Corrosio repugnans	Praeclarus
Metal Impurity Content	＜5 ppm

Electrical Properties	Values
Resistentia	7*10⁷Ω.cm
Nulla virtus	250~400Kv/cm
Dielectric Constant	3.7~3.9
Absorptio Dieelectrica Coefficient	＜4*10^-4
Dielectric Loss Coefficient	＜1*10^-4